High-precision measurement and adjustment system for wafer production
In order to cut costs in semiconductor production, wafers are being made ever larger and ever more densely printed. This also increases the requirements in terms of the size and the precision of the lenses. For the exposure of the wafers in the chip production plants, Carl Zeiss AG uses extremely large lenses of the highest quality. These lenses have to be perfectly adjusted and measured, in some cases with up to 1 nanometer precision.
These lenses are measured in and adjusted with 16 axes. They are controlled via a PC with 16 CAN-networked MK1 1-axis compact control systems.
The compact form - the amplifiers are integrated - and the high precision of the MK1 make it ideal for handling this difficult and complex task.
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Adjustment of the lenses for the wafer production with nanometer precision.
Photo:
© Carl Zeiss AG
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